UCLA seeks PFC alternative for semiconductor industry
11:26 AM MDT | March 21, 2013 | Rebecca Coons
University of California, Los Angeles (UCLA) researchers today announced development of a modeling process designed to simulate atomic-level etching with chemicals that are effective alternatives to widely used perfluorocarbon (PFC) gases. Their work was sponsored by the sponsored by Semiconductor Research Corp. (SRC). The novel approach is expected to enable the identification and evaluation of plasma chemistries for processing emerging memory/logic devices and through-silicon-via (TSV)-enabled technologies for the semiconductor industry. The research will focus...
Already an IHS Chemical Week member? Login here
Forgot your user ID or password? Click here to have it sent to you.
Click here for 6 months access to the lates news, data and statistics on sustainability. PLUS all the news and analysis from the Chemical Week editorial team updated everyday on IHS Chemical Week