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Markets :: Specialty Chemicals :: Electronic chemicals R&H Opens Immersion Lithography Facility11:10 AM MDT | July 8, 2008 | Michelle Bryner Rohm and Haas (R&H) says it has opened its $60-million, immersion lithography facility located in the company's Advanced Technology Center at Marlborough, MA. The investment, about $40 million of which was for a 193-nm immersion lithography tool, will support the company’s efforts to develop photoresists and advanced patterning materials, including anti-reflectants and topcoats, for immersion lithography. The 193-nm immersion lithography tool is the same “tool set” used by fabricators including IBM, Intel, and Samsung, says Jim Fahey, v.p... This information is only available to Chemical Week subscribers. Forgot your user ID or password?
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