IHS Chemical Week

Markets :: Specialty Chemicals :: Electronic chemicals

R&H Opens Immersion Lithography Facility

11:03 AM MDT | July 8, 2008 | Michelle Bryner

Rohm and Haas (R&H) says it has opened its $60-million, immersion lithography facility located in the company's Advanced Technology Center at Marlborough, MA. The investment, about $40 million of which was for a 193-nm immersion lithography tool, will support the company’s efforts to develop photoresists and advanced patterning materials, including anti-reflectants and topcoats, for immersion lithography. The 193-nm immersion lithography tool is the same “tool set” used by fabricators including IBM, Intel, and Samsung, says Jim Fahey, v.p...

This information is only available to Chemical Week subscribers.


Forgot your user ID or password?
Click here to have it sent to you.

Not an IHS Chemical Week subscriber yet?

Here's why you should be:

  • 31 issues of Chemical Week magazine a year in print or digital format
  • Real time news and analysis on chemweek.com 
  • 20+ years of online archives
  • Topical e-newsletters that capture the most impactful events
  • Special issues with a regional or company focus
  • Global Outlook issue

Subscribe now


contact us | about us | privacy policy | sitemap

ihsCopyright © IHS, Inc.All rights reserved.Reproduction in whole or in part without permission is prohibited.

North Asia Russia Southeast Asia China India/Pakistan Middle East Eastern Europe Western Europe Central America Canada USA Australia/New Zealand South America Africa