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Court of Appeals Rules that DA Nanomaterials Does Not Infringe Tungsten CMP Patents
2:01 PM MST | November 17, 2011 | Robert Westervelt
The U.S. Court of Appeals for the Federal Circuit has upheld a July 2010 jury decision in the U.S. District Court in Arizona holding that various DuPont Air Products Nanomaterials (DA Nanomaterials) tungsten chemical mechanical planarization (CMP) slurries do not infringe Cabot Microelectronic's patents. The court also upheld the validity of Cabot Microelectronics’ patents at issue....
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