IHS Chemical Week

Jury Upholds Patent Filed by DA Nanomaterials

2:18 PM MST | November 22, 2011 | Rebecca Coons

The U.S. Court of Appeals for the Federal Circuit has upheld a July 2010 jury decision in the U.S. District Court in Arizona that various DuPont Air Products Nanomaterials (DA Nanomaterials) tungsten chemical mechanical planarization (CMP) slurries do not infringe Cabot Microelectronic’s patents. “There is strong demand for a viable alternative tungsten CMP slurry, and we are happy that the path is now clear for DA Nanomaterials to further execute its growth strategy in this important market,” says DA Nanomaterials CEO Seng Wui Lim. The court...

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