EnviroTech :: Nanotech
Weekly Industry Innovation News Round-up, April 27
9:20 AM MDT | July 12, 2012 | Alex Scott
A two-year nanocomposite collaboration between Pixelligent Technologies and Brewer Science has yielded a next-generation lithography solution that dramatically improves etch resistance, process window, and line edge roughness while offering broad resist compatibility. The new spin-on hardmask technology incorporates Pixelligent’s nanocrystal and dispersion technologies with Brewer’s polymer technology. The two companies received a $8.2-million grant from the National Institute of Standards and Technology’s (NIST) Technology Innovation...
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