IHS Chemical Week

EnviroTech :: Nanotech

Electronics: BASF and Evonik Co-develop CMP Slurries

7:08 AM MDT | July 4, 2008 |

Alex Scott

 Evonik Industries and BASF say they have agreed to co-develop ceria-based slurries used in the fabrication of computer chips. The agreement will leverage BASF’s chemical expertise, global marketing and distribution capabilities with Evonik´s leading position in nanomaterials, the two companies say. The companies say they plan to commercialize any products from the collaboration from 2009.   Slurries containing nanoscale materials such as ceria are used to polish the silicon dioxide surfaces of wafers to produce highly planar...

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