IHS Chemical Week

EnviroTech :: Innovation

Shin-Etsu EUV Project

3:00 PM MDT | September 4, 2009

Semiconductor industry group Sematech (Austin) says Shin-Etsu Chemical has joined its Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE; Albany) and will be collaborating to develop extreme ultraviolet lithography (EUV) photoresists for use at the 22 nm node. Partnering with Shin-Etsu, one of the world’s largest suppliers of semiconductor materials, will accelerate the group’s progress on improving resolution, line-width roughness, and pattern collapse, Sematech...

This information is only available to Chemical Week subscribers.


Forgot your user ID or password?
Click here to have it sent to you.

Not an IHS Chemical Week member yet?

Here's why you should be:

  • 31 issues of Chemical Week magazine in print or digital format
  • Critical daily news and analysis on chemweek.com
  • Free mobile edition 
  • 20+ years of online archives
  • Topical e-newsletters that capture the most impactful events
  • Special issues with a regional or company focus
  • Global Outlook issue

Subscribe now

100% Satisfaction Guarantee
If at any time you are not completely satisfied with IHS Chemical Week, simply notify us and we'll refund the balance of your paid subscription - no problem.

Learn more about group subscriptions and site licenses.


contact us | about us | customer care | privacy policy | sitemap | advertise

ihsCopyright © 2015 IHS, Inc. All rights reserved. Reproduction in whole or in part without permission is prohibited.

North Asia Russia Southeast Asia China India/Pakistan Middle East Eastern Europe Western Europe Central America Canada USA Australia/New Zealand South America Africa