in this issue
EnviroTech :: Innovation
Shin-Etsu EUV Project
3:00 PM MDT | September 4, 2009
Semiconductor industry group Sematech (Austin) says Shin-Etsu Chemical has joined its Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE; Albany) and will be collaborating to develop extreme ultraviolet lithography (EUV) photoresists for use at the 22 nm node. Partnering with Shin-Etsu, one of the world’s largest suppliers of semiconductor materials, will accelerate the group’s progress on improving resolution, line-width roughness, and pattern collapse, Sematech...
This information is only available to Chemical Week subscribers.
Forgot your user ID or password?
Not an IHS Chemical Week member yet?
Here's why you should be:
100% Satisfaction Guarantee