![]() |
|
searchpremium serviceseventsdirectory servicesadvertisingcustomer care |
EnviroTech :: Innovation Electronics: BASF and Evonik Co-develop CMP Slurries7:26 AM MDT | July 4, 2008 | Alex Scott Evonik Industries and BASF say they have agreed to co-develop ceria-based slurries used in the fabrication of computer chips. The agreement will leverage BASF’s chemical expertise, global marketing and distribution capabilities with... This information is only available to Forgot your user ID or password?
|
Not an IHS Chemical Week
|
Connect with IHS Chemical Week |
Quick links |
Our related sites |
|
contact us | about us |
customer care |
privacy policy |
sitemap |
advertise
|