Weekly Industry Innovation News Round-up, April 27

A two-year nanocomposite collaboration between Pixelligent Technologies and Brewer Science has yielded a next-generation lithography solution that dramatically improves etch resistance, process window, and line edge roughness while offering broad resist compatibility. The new spin-on hardmask technology incorporates Pixelligent’s nanocrystal and dispersion technologies with Brewer’s polymer technology. The two companies received a $8.2-million grant from the National Institute of Standards and Technology’s (NIST)  Technology Innovation...

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